id	sid	tid	token	lemma	pos
sx61dj56g2p	1	1	plasmonic	plasmonic	ADJ
sx61dj56g2p	1	2	noble	noble	ADJ
sx61dj56g2p	1	3	metal	metal	NOUN
sx61dj56g2p	1	4	nanostructures	nanostructure	NOUN
sx61dj56g2p	1	5	exhibit	exhibit	VERB
sx61dj56g2p	1	6	unique	unique	ADJ
sx61dj56g2p	1	7	light	light	ADJ
sx61dj56g2p	1	8	-	-	PUNCT
sx61dj56g2p	1	9	matter	matter	NOUN
sx61dj56g2p	1	10	interactions	interaction	NOUN
sx61dj56g2p	1	11	which	which	PRON
sx61dj56g2p	1	12	are	be	AUX
sx61dj56g2p	1	13	dependent	dependent	ADJ
sx61dj56g2p	1	14	on	on	ADP
sx61dj56g2p	1	15	their	their	PRON
sx61dj56g2p	1	16	nanometer	nanometer	ADJ
sx61dj56g2p	1	17	-	-	PUNCT
sx61dj56g2p	1	18	scale	scale	NOUN
sx61dj56g2p	1	19	dimensions	dimension	NOUN
sx61dj56g2p	1	20	and	and	CCONJ
sx61dj56g2p	1	21	which	which	PRON
sx61dj56g2p	1	22	can	can	AUX
sx61dj56g2p	1	23	not	not	PART
sx61dj56g2p	1	24	be	be	AUX
sx61dj56g2p	1	25	realized	realize	VERB
sx61dj56g2p	1	26	on	on	ADP
sx61dj56g2p	1	27	the	the	DET
sx61dj56g2p	1	28	macro	macro	NOUN
sx61dj56g2p	1	29	-	-	NOUN
sx61dj56g2p	1	30	scale	scale	NOUN
sx61dj56g2p	1	31	.	.	PUNCT
sx61dj56g2p	2	1	in	in	ADP
sx61dj56g2p	2	2	recent	recent	ADJ
sx61dj56g2p	2	3	years	year	NOUN
sx61dj56g2p	2	4	,	,	PUNCT
sx61dj56g2p	2	5	applications	application	NOUN
sx61dj56g2p	2	6	have	have	AUX
sx61dj56g2p	2	7	been	be	AUX
sx61dj56g2p	2	8	found	find	VERB
sx61dj56g2p	2	9	that	that	PRON
sx61dj56g2p	2	10	capitalize	capitalize	VERB
sx61dj56g2p	2	11	on	on	ADP
sx61dj56g2p	2	12	these	these	DET
sx61dj56g2p	2	13	properties	property	NOUN
sx61dj56g2p	2	14	in	in	ADP
sx61dj56g2p	2	15	the	the	DET
sx61dj56g2p	2	16	development	development	NOUN
sx61dj56g2p	2	17	of	of	ADP
sx61dj56g2p	2	18	optoelectronic	optoelectronic	ADJ
sx61dj56g2p	2	19	components	component	NOUN
sx61dj56g2p	2	20	,	,	PUNCT
sx61dj56g2p	2	21	highly	highly	ADV
sx61dj56g2p	2	22	sensitive	sensitive	ADJ
sx61dj56g2p	2	23	biological	biological	ADJ
sx61dj56g2p	2	24	and	and	CCONJ
sx61dj56g2p	2	25	chemical	chemical	NOUN
sx61dj56g2p	2	26	sensors	sensor	NOUN
sx61dj56g2p	2	27	,	,	PUNCT
sx61dj56g2p	2	28	metasurfaces	metasurface	NOUN
sx61dj56g2p	2	29	,	,	PUNCT
sx61dj56g2p	2	30	and	and	CCONJ
sx61dj56g2p	2	31	photochemistry	photochemistry	NOUN
sx61dj56g2p	2	32	.	.	PUNCT
sx61dj56g2p	3	1	these	these	DET
sx61dj56g2p	3	2	applications	application	NOUN
sx61dj56g2p	3	3	have	have	VERB
sx61dj56g2p	3	4	a	a	DET
sx61dj56g2p	3	5	strong	strong	ADJ
sx61dj56g2p	3	6	dependence	dependence	NOUN
sx61dj56g2p	3	7	on	on	ADP
sx61dj56g2p	3	8	nanostructure	nanostructure	ADJ
sx61dj56g2p	3	9	geometry	geometry	NOUN
sx61dj56g2p	3	10	and	and	CCONJ
sx61dj56g2p	3	11	size	size	NOUN
sx61dj56g2p	3	12	,	,	PUNCT
sx61dj56g2p	3	13	as	as	ADV
sx61dj56g2p	3	14	well	well	ADV
sx61dj56g2p	3	15	as	as	ADP
sx61dj56g2p	3	16	the	the	DET
sx61dj56g2p	3	17	ability	ability	NOUN
sx61dj56g2p	3	18	to	to	PART
sx61dj56g2p	3	19	place	place	VERB
sx61dj56g2p	3	20	structures	structure	NOUN
sx61dj56g2p	3	21	on	on	ADP
sx61dj56g2p	3	22	a	a	DET
sx61dj56g2p	3	23	surface	surface	NOUN
sx61dj56g2p	3	24	in	in	ADP
sx61dj56g2p	3	25	an	an	DET
sx61dj56g2p	3	26	organized	organize	VERB
sx61dj56g2p	3	27	manner	manner	NOUN
sx61dj56g2p	3	28	for	for	ADP
sx61dj56g2p	3	29	the	the	DET
sx61dj56g2p	3	30	fabrication	fabrication	NOUN
sx61dj56g2p	3	31	of	of	ADP
sx61dj56g2p	3	32	functional	functional	ADJ
sx61dj56g2p	3	33	devices	device	NOUN
sx61dj56g2p	3	34	.	.	PUNCT
sx61dj56g2p	4	1	electron	electron	NOUN
sx61dj56g2p	4	2	beam	beam	NOUN
sx61dj56g2p	4	3	lithography	lithography	NOUN
sx61dj56g2p	4	4	has	have	AUX
sx61dj56g2p	4	5	long	long	ADV
sx61dj56g2p	4	6	been	be	AUX
sx61dj56g2p	4	7	the	the	DET
sx61dj56g2p	4	8	most	most	ADV
sx61dj56g2p	4	9	powerful	powerful	ADJ
sx61dj56g2p	4	10	method	method	NOUN
sx61dj56g2p	4	11	for	for	ADP
sx61dj56g2p	4	12	fabricating	fabricate	VERB
sx61dj56g2p	4	13	surfaces	surface	NOUN
sx61dj56g2p	4	14	of	of	ADP
sx61dj56g2p	4	15	plasmonic	plasmonic	ADJ
sx61dj56g2p	4	16	nanostructures	nanostructure	NOUN
sx61dj56g2p	4	17	and	and	CCONJ
sx61dj56g2p	4	18	is	be	AUX
sx61dj56g2p	4	19	capable	capable	ADJ
sx61dj56g2p	4	20	of	of	ADP
sx61dj56g2p	4	21	generating	generate	VERB
sx61dj56g2p	4	22	complex	complex	ADJ
sx61dj56g2p	4	23	shapes	shape	NOUN
sx61dj56g2p	4	24	with	with	ADP
sx61dj56g2p	4	25	a	a	DET
sx61dj56g2p	4	26	high	high	ADJ
sx61dj56g2p	4	27	degree	degree	NOUN
sx61dj56g2p	4	28	of	of	ADP
sx61dj56g2p	4	29	orientational	orientational	ADJ
sx61dj56g2p	4	30	and	and	CCONJ
sx61dj56g2p	4	31	placement	placement	NOUN
sx61dj56g2p	4	32	control	control	NOUN
sx61dj56g2p	4	33	on	on	ADP
sx61dj56g2p	4	34	the	the	DET
sx61dj56g2p	4	35	substrate	substrate	NOUN
sx61dj56g2p	4	36	surface	surface	NOUN
sx61dj56g2p	4	37	.	.	PUNCT
sx61dj56g2p	5	1	however	however	ADV
sx61dj56g2p	5	2	,	,	PUNCT
sx61dj56g2p	5	3	it	it	PRON
sx61dj56g2p	5	4	exhibits	exhibit	VERB
sx61dj56g2p	5	5	notable	notable	ADJ
sx61dj56g2p	5	6	weaknesses	weakness	NOUN
sx61dj56g2p	5	7	in	in	ADP
sx61dj56g2p	5	8	(	(	PUNCT
sx61dj56g2p	5	9	i	i	NOUN
sx61dj56g2p	5	10	)	)	PUNCT
sx61dj56g2p	5	11	a	a	DET
sx61dj56g2p	5	12	highly	highly	ADV
sx61dj56g2p	5	13	time	time	NOUN
sx61dj56g2p	5	14	-	-	PUNCT
sx61dj56g2p	5	15	intensive	intensive	ADJ
sx61dj56g2p	5	16	and	and	CCONJ
sx61dj56g2p	5	17	technically	technically	ADV
sx61dj56g2p	5	18	demanding	demand	VERB
sx61dj56g2p	5	19	serial	serial	ADJ
sx61dj56g2p	5	20	writing	writing	NOUN
sx61dj56g2p	5	21	process	process	NOUN
sx61dj56g2p	5	22	,	,	PUNCT
sx61dj56g2p	5	23	(	(	PUNCT
sx61dj56g2p	5	24	ii	ii	PROPN
sx61dj56g2p	5	25	)	)	PUNCT
sx61dj56g2p	5	26	the	the	DET
sx61dj56g2p	5	27	relative	relative	ADJ
sx61dj56g2p	5	28	scarcity	scarcity	NOUN
sx61dj56g2p	5	29	and	and	CCONJ
sx61dj56g2p	5	30	high	high	ADJ
sx61dj56g2p	5	31	expense	expense	NOUN
sx61dj56g2p	5	32	of	of	ADP
sx61dj56g2p	5	33	equipment	equipment	NOUN
sx61dj56g2p	5	34	,	,	PUNCT
sx61dj56g2p	5	35	(	(	PUNCT
sx61dj56g2p	5	36	iii	iii	X
sx61dj56g2p	5	37	)	)	PUNCT
sx61dj56g2p	5	38	a	a	DET
sx61dj56g2p	5	39	difficulty	difficulty	NOUN
sx61dj56g2p	5	40	to	to	PART
sx61dj56g2p	5	41	produce	produce	VERB
sx61dj56g2p	5	42	monocrystalline	monocrystalline	ADJ
sx61dj56g2p	5	43	structures	structure	NOUN
sx61dj56g2p	5	44	when	when	SCONJ
sx61dj56g2p	5	45	positive	positive	ADJ
sx61dj56g2p	5	46	resists	resist	NOUN
sx61dj56g2p	5	47	are	be	AUX
sx61dj56g2p	5	48	used	use	VERB
sx61dj56g2p	5	49	,	,	PUNCT
sx61dj56g2p	5	50	(	(	PUNCT
sx61dj56g2p	5	51	iv	iv	X
sx61dj56g2p	5	52	)	)	PUNCT
sx61dj56g2p	5	53	limits	limit	NOUN
sx61dj56g2p	5	54	in	in	ADP
sx61dj56g2p	5	55	resolution	resolution	NOUN
sx61dj56g2p	5	56	that	that	PRON
sx61dj56g2p	5	57	present	present	ADJ
sx61dj56g2p	5	58	challenges	challenge	NOUN
sx61dj56g2p	5	59	in	in	ADP
sx61dj56g2p	5	60	the	the	DET
sx61dj56g2p	5	61	fabrication	fabrication	NOUN
sx61dj56g2p	5	62	of	of	ADP
sx61dj56g2p	5	63	plasmonic	plasmonic	ADJ
sx61dj56g2p	5	64	structures	structure	NOUN
sx61dj56g2p	5	65	with	with	ADP
sx61dj56g2p	5	66	sharp	sharp	ADJ
sx61dj56g2p	5	67	tips	tip	NOUN
sx61dj56g2p	5	68	and	and	CCONJ
sx61dj56g2p	5	69	nanogaps	nanogap	NOUN
sx61dj56g2p	5	70	,	,	PUNCT
sx61dj56g2p	5	71	and	and	CCONJ
sx61dj56g2p	5	72	(	(	PUNCT
sx61dj56g2p	5	73	v	v	NOUN
sx61dj56g2p	5	74	)	)	PUNCT
sx61dj56g2p	5	75	an	an	DET
sx61dj56g2p	5	76	inability	inability	NOUN
sx61dj56g2p	5	77	to	to	PART
sx61dj56g2p	5	78	produce	produce	VERB
sx61dj56g2p	5	79	structures	structure	NOUN
sx61dj56g2p	5	80	with	with	ADP
sx61dj56g2p	5	81	anything	anything	PRON
sx61dj56g2p	5	82	but	but	CCONJ
sx61dj56g2p	5	83	straight	straight	ADV
sx61dj56g2p	5	84	-	-	PUNCT
sx61dj56g2p	5	85	walled	wall	VERB
sx61dj56g2p	5	86	two	two	NUM
sx61dj56g2p	5	87	-	-	PUNCT
sx61dj56g2p	5	88	dimensional	dimensional	ADJ
sx61dj56g2p	5	89	profiles	profile	NOUN
sx61dj56g2p	5	90	without	without	ADP
sx61dj56g2p	5	91	increasingly	increasingly	ADV
sx61dj56g2p	5	92	complicated	complicated	ADJ
sx61dj56g2p	5	93	processes	process	NOUN
sx61dj56g2p	5	94	and	and	CCONJ
sx61dj56g2p	5	95	instrumentation	instrumentation	NOUN
sx61dj56g2p	5	96	.	.	PUNCT
sx61dj56g2p	6	1	alternative	alternative	ADJ
sx61dj56g2p	6	2	low	low	ADJ
sx61dj56g2p	6	3	-	-	PUNCT
sx61dj56g2p	6	4	cost	cost	NOUN
sx61dj56g2p	6	5	lithographic	lithographic	ADJ
sx61dj56g2p	6	6	processes	process	NOUN
sx61dj56g2p	6	7	have	have	AUX
sx61dj56g2p	6	8	been	be	AUX
sx61dj56g2p	6	9	devised	devise	VERB
sx61dj56g2p	6	10	in	in	ADP
sx61dj56g2p	6	11	attempts	attempt	NOUN
sx61dj56g2p	6	12	to	to	PART
sx61dj56g2p	6	13	improve	improve	VERB
sx61dj56g2p	6	14	the	the	DET
sx61dj56g2p	6	15	accessibility	accessibility	NOUN
sx61dj56g2p	6	16	and	and	CCONJ
sx61dj56g2p	6	17	throughput	throughput	NOUN
sx61dj56g2p	6	18	of	of	ADP
sx61dj56g2p	6	19	array	array	NOUN
sx61dj56g2p	6	20	-	-	PUNCT
sx61dj56g2p	6	21	based	base	VERB
sx61dj56g2p	6	22	nanostructures	nanostructure	NOUN
sx61dj56g2p	6	23	,	,	PUNCT
sx61dj56g2p	6	24	but	but	CCONJ
sx61dj56g2p	6	25	likewise	likewise	ADV
sx61dj56g2p	6	26	fall	fall	VERB
sx61dj56g2p	6	27	short	short	ADV
sx61dj56g2p	6	28	in	in	ADP
sx61dj56g2p	6	29	the	the	DET
sx61dj56g2p	6	30	ability	ability	NOUN
sx61dj56g2p	6	31	to	to	PART
sx61dj56g2p	6	32	generate	generate	VERB
sx61dj56g2p	6	33	complex	complex	ADJ
sx61dj56g2p	6	34	structures	structure	NOUN
sx61dj56g2p	6	35	in	in	ADP
sx61dj56g2p	6	36	organized	organize	VERB
sx61dj56g2p	6	37	arrays	array	NOUN
sx61dj56g2p	6	38	with	with	ADP
sx61dj56g2p	6	39	true	true	ADJ
sx61dj56g2p	6	40	long	long	ADJ
sx61dj56g2p	6	41	-	-	PUNCT
sx61dj56g2p	6	42	range	range	NOUN
sx61dj56g2p	6	43	order	order	NOUN
sx61dj56g2p	6	44	.	.	PUNCT
sx61dj56g2p	7	1	other	other	ADJ
sx61dj56g2p	7	2	hybrid	hybrid	NOUN
sx61dj56g2p	7	3	processes	process	NOUN
sx61dj56g2p	7	4	capitalize	capitalize	VERB
sx61dj56g2p	7	5	on	on	ADP
sx61dj56g2p	7	6	the	the	DET
sx61dj56g2p	7	7	ability	ability	NOUN
sx61dj56g2p	7	8	of	of	ADP
sx61dj56g2p	7	9	colloidal	colloidal	ADJ
sx61dj56g2p	7	10	syntheses	synthesis	NOUN
sx61dj56g2p	7	11	to	to	PART
sx61dj56g2p	7	12	produce	produce	VERB
sx61dj56g2p	7	13	complex	complex	ADJ
sx61dj56g2p	7	14	,	,	PUNCT
sx61dj56g2p	7	15	highly	highly	ADV
sx61dj56g2p	7	16	crystalline	crystalline	ADJ
sx61dj56g2p	7	17	nanostructures	nanostructure	NOUN
sx61dj56g2p	7	18	,	,	PUNCT
sx61dj56g2p	7	19	followed	follow	VERB
sx61dj56g2p	7	20	by	by	ADP
sx61dj56g2p	7	21	the	the	DET
sx61dj56g2p	7	22	use	use	NOUN
sx61dj56g2p	7	23	of	of	ADP
sx61dj56g2p	7	24	a	a	DET
sx61dj56g2p	7	25	variety	variety	NOUN
sx61dj56g2p	7	26	of	of	ADP
sx61dj56g2p	7	27	techniques	technique	NOUN
sx61dj56g2p	7	28	that	that	PRON
sx61dj56g2p	7	29	place	place	VERB
sx61dj56g2p	7	30	structures	structure	NOUN
sx61dj56g2p	7	31	at	at	ADP
sx61dj56g2p	7	32	lithographically	lithographically	ADV
sx61dj56g2p	7	33	defined	define	VERB
sx61dj56g2p	7	34	locations	location	NOUN
sx61dj56g2p	7	35	on	on	ADP
sx61dj56g2p	7	36	a	a	DET
sx61dj56g2p	7	37	substrate	substrate	NOUN
sx61dj56g2p	7	38	surface	surface	NOUN
sx61dj56g2p	7	39	.	.	PUNCT
sx61dj56g2p	8	1	while	while	SCONJ
sx61dj56g2p	8	2	impressive	impressive	ADJ
sx61dj56g2p	8	3	,	,	PUNCT
sx61dj56g2p	8	4	these	these	DET
sx61dj56g2p	8	5	methods	method	NOUN
sx61dj56g2p	8	6	are	be	AUX
sx61dj56g2p	8	7	limited	limit	VERB
sx61dj56g2p	8	8	by	by	ADP
sx61dj56g2p	8	9	the	the	DET
sx61dj56g2p	8	10	homogeneity	homogeneity	NOUN
sx61dj56g2p	8	11	of	of	ADP
sx61dj56g2p	8	12	the	the	DET
sx61dj56g2p	8	13	colloid	colloid	NOUN
sx61dj56g2p	8	14	,	,	PUNCT
sx61dj56g2p	8	15	exhibit	exhibit	VERB
sx61dj56g2p	8	16	a	a	DET
sx61dj56g2p	8	17	reliance	reliance	NOUN
sx61dj56g2p	8	18	on	on	ADP
sx61dj56g2p	8	19	electron	electron	NOUN
sx61dj56g2p	8	20	beam	beam	NOUN
sx61dj56g2p	8	21	lithography	lithography	NOUN
sx61dj56g2p	8	22	,	,	PUNCT
sx61dj56g2p	8	23	and	and	CCONJ
sx61dj56g2p	8	24	are	be	AUX
sx61dj56g2p	8	25	challenged	challenge	VERB
sx61dj56g2p	8	26	in	in	ADP
sx61dj56g2p	8	27	providing	provide	VERB
sx61dj56g2p	8	28	consistent	consistent	ADJ
sx61dj56g2p	8	29	alignment	alignment	NOUN
sx61dj56g2p	8	30	for	for	ADP
sx61dj56g2p	8	31	asymmetric	asymmetric	ADJ
sx61dj56g2p	8	32	structures	structure	NOUN
sx61dj56g2p	8	33	.	.	PUNCT
sx61dj56g2p	9	1	herein	herein	ADV
sx61dj56g2p	9	2	a	a	DET
sx61dj56g2p	9	3	low	low	ADJ
sx61dj56g2p	9	4	-	-	PUNCT
sx61dj56g2p	9	5	cost	cost	NOUN
sx61dj56g2p	9	6	,	,	PUNCT
sx61dj56g2p	9	7	rapid	rapid	ADJ
sx61dj56g2p	9	8	processing	processing	NOUN
sx61dj56g2p	9	9	route	route	NOUN
sx61dj56g2p	9	10	is	be	AUX
sx61dj56g2p	9	11	put	put	VERB
sx61dj56g2p	9	12	forth	forth	ADV
sx61dj56g2p	9	13	to	to	PART
sx61dj56g2p	9	14	address	address	VERB
sx61dj56g2p	9	15	the	the	DET
sx61dj56g2p	9	16	shortcomings	shortcoming	NOUN
sx61dj56g2p	9	17	of	of	ADP
sx61dj56g2p	9	18	existing	exist	VERB
sx61dj56g2p	9	19	processes	process	NOUN
sx61dj56g2p	9	20	that	that	PRON
sx61dj56g2p	9	21	provides	provide	VERB
sx61dj56g2p	9	22	(	(	PUNCT
sx61dj56g2p	9	23	i	i	NOUN
sx61dj56g2p	9	24	)	)	PUNCT
sx61dj56g2p	9	25	a	a	DET
sx61dj56g2p	9	26	high	high	ADJ
sx61dj56g2p	9	27	degree	degree	NOUN
sx61dj56g2p	9	28	of	of	ADP
sx61dj56g2p	9	29	placement	placement	NOUN
sx61dj56g2p	9	30	control	control	NOUN
sx61dj56g2p	9	31	over	over	ADP
sx61dj56g2p	9	32	1	1	NUM
sx61dj56g2p	9	33	cm^2	cm^2	NOUN
sx61dj56g2p	9	34	areas	area	NOUN
sx61dj56g2p	9	35	through	through	ADP
sx61dj56g2p	9	36	the	the	DET
sx61dj56g2p	9	37	use	use	NOUN
sx61dj56g2p	9	38	of	of	ADP
sx61dj56g2p	9	39	nanoimprint	nanoimprint	NOUN
sx61dj56g2p	9	40	lithography	lithography	NOUN
sx61dj56g2p	9	41	,	,	PUNCT
sx61dj56g2p	9	42	(	(	PUNCT
sx61dj56g2p	9	43	ii	ii	PROPN
sx61dj56g2p	9	44	)	)	PUNCT
sx61dj56g2p	9	45	orientational	orientational	ADJ
sx61dj56g2p	9	46	control	control	NOUN
sx61dj56g2p	9	47	and	and	CCONJ
sx61dj56g2p	9	48	a	a	DET
sx61dj56g2p	9	49	high	high	ADJ
sx61dj56g2p	9	50	crystallinity	crystallinity	NOUN
sx61dj56g2p	9	51	of	of	ADP
sx61dj56g2p	9	52	nanostructures	nanostructure	NOUN
sx61dj56g2p	9	53	through	through	ADP
sx61dj56g2p	9	54	the	the	DET
sx61dj56g2p	9	55	establishment	establishment	NOUN
sx61dj56g2p	9	56	of	of	ADP
sx61dj56g2p	9	57	an	an	DET
sx61dj56g2p	9	58	epitaxial	epitaxial	ADJ
sx61dj56g2p	9	59	relationship	relationship	NOUN
sx61dj56g2p	9	60	between	between	ADP
sx61dj56g2p	9	61	the	the	DET
sx61dj56g2p	9	62	seed	seed	NOUN
sx61dj56g2p	9	63	and	and	CCONJ
sx61dj56g2p	9	64	crystalline	crystalline	NOUN
sx61dj56g2p	9	65	substrate	substrate	NOUN
sx61dj56g2p	9	66	using	use	VERB
sx61dj56g2p	9	67	high	high	ADJ
sx61dj56g2p	9	68	-	-	PUNCT
sx61dj56g2p	9	69	temperature	temperature	NOUN
sx61dj56g2p	9	70	vapor	vapor	NOUN
sx61dj56g2p	9	71	-	-	PUNCT
sx61dj56g2p	9	72	phase	phase	NOUN
sx61dj56g2p	9	73	assembly	assembly	NOUN
sx61dj56g2p	9	74	,	,	PUNCT
sx61dj56g2p	9	75	and	and	CCONJ
sx61dj56g2p	9	76	(	(	PUNCT
sx61dj56g2p	9	77	iii	iii	NUM
sx61dj56g2p	9	78	)	)	PUNCT
sx61dj56g2p	9	79	geometric	geometric	ADJ
sx61dj56g2p	9	80	control	control	NOUN
sx61dj56g2p	9	81	of	of	ADP
sx61dj56g2p	9	82	sophisticated	sophisticated	ADJ
sx61dj56g2p	9	83	structures	structure	NOUN
sx61dj56g2p	9	84	through	through	ADP
sx61dj56g2p	9	85	the	the	DET
sx61dj56g2p	9	86	use	use	NOUN
sx61dj56g2p	9	87	of	of	ADP
sx61dj56g2p	9	88	liquid	liquid	ADJ
sx61dj56g2p	9	89	-	-	PUNCT
sx61dj56g2p	9	90	phase	phase	NOUN
sx61dj56g2p	9	91	chemical	chemical	NOUN
sx61dj56g2p	9	92	syntheses	synthesis	NOUN
sx61dj56g2p	9	93	.	.	PUNCT
sx61dj56g2p	10	1	this	this	DET
sx61dj56g2p	10	2	process	process	NOUN
sx61dj56g2p	10	3	is	be	AUX
sx61dj56g2p	10	4	demonstrated	demonstrate	VERB
sx61dj56g2p	10	5	through	through	ADP
sx61dj56g2p	10	6	the	the	DET
sx61dj56g2p	10	7	synthesis	synthesis	NOUN
sx61dj56g2p	10	8	of	of	ADP
sx61dj56g2p	10	9	large	large	ADJ
sx61dj56g2p	10	10	-	-	PUNCT
sx61dj56g2p	10	11	area	area	NOUN
sx61dj56g2p	10	12	arrays	array	NOUN
sx61dj56g2p	10	13	of	of	ADP
sx61dj56g2p	10	14	au	au	X
sx61dj56g2p	10	15	structures	structure	NOUN
sx61dj56g2p	10	16	on	on	ADP
sx61dj56g2p	10	17	sapphire	sapphire	NOUN
sx61dj56g2p	10	18	substrates	substrate	NOUN
sx61dj56g2p	10	19	using	use	VERB
sx61dj56g2p	10	20	plasmon	plasmon	NOUN
sx61dj56g2p	10	21	-	-	PUNCT
sx61dj56g2p	10	22	mediated	mediate	VERB
sx61dj56g2p	10	23	liquid	liquid	NOUN
sx61dj56g2p	10	24	-	-	PUNCT
sx61dj56g2p	10	25	phase	phase	NOUN
sx61dj56g2p	10	26	syntheses	synthesis	NOUN
sx61dj56g2p	10	27	to	to	PART
sx61dj56g2p	10	28	grow	grow	VERB
sx61dj56g2p	10	29	hexagonal	hexagonal	ADJ
sx61dj56g2p	10	30	and	and	CCONJ
sx61dj56g2p	10	31	triangular	triangular	ADJ
sx61dj56g2p	10	32	nanoplates	nanoplate	NOUN
sx61dj56g2p	10	33	on	on	ADP
sx61dj56g2p	10	34	the	the	DET
sx61dj56g2p	10	35	substrate	substrate	NOUN
sx61dj56g2p	10	36	surface	surface	NOUN
sx61dj56g2p	10	37	,	,	PUNCT
sx61dj56g2p	10	38	as	as	ADV
sx61dj56g2p	10	39	well	well	ADV
sx61dj56g2p	10	40	as	as	ADP
sx61dj56g2p	10	41	chiral	chiral	ADJ
sx61dj56g2p	10	42	nanostructures	nanostructure	NOUN
sx61dj56g2p	10	43	exhibiting	exhibit	VERB
sx61dj56g2p	10	44	a	a	DET
sx61dj56g2p	10	45	spiral	spiral	ADJ
sx61dj56g2p	10	46	geometry	geometry	NOUN
sx61dj56g2p	10	47	.	.	PUNCT
sx61dj56g2p	11	1	as	as	SCONJ
sx61dj56g2p	11	2	shown	show	VERB
sx61dj56g2p	11	3	via	via	ADP
sx61dj56g2p	11	4	tem	tem	PROPN
sx61dj56g2p	11	5	cross	cross	PROPN
sx61dj56g2p	11	6	-	-	ADJ
sx61dj56g2p	11	7	sectional	sectional	ADJ
sx61dj56g2p	11	8	and	and	CCONJ
sx61dj56g2p	11	9	top	top	ADJ
sx61dj56g2p	11	10	-	-	PUNCT
sx61dj56g2p	11	11	down	down	ADP
sx61dj56g2p	11	12	analysis	analysis	NOUN
sx61dj56g2p	11	13	,	,	PUNCT
sx61dj56g2p	11	14	it	it	PRON
sx61dj56g2p	11	15	is	be	AUX
sx61dj56g2p	11	16	demonstrated	demonstrate	VERB
sx61dj56g2p	11	17	that	that	SCONJ
sx61dj56g2p	11	18	au	au	ADJ
sx61dj56g2p	11	19	seeds	seed	NOUN
sx61dj56g2p	11	20	can	can	AUX
sx61dj56g2p	11	21	be	be	AUX
sx61dj56g2p	11	22	formed	form	VERB
sx61dj56g2p	11	23	on	on	ADP
sx61dj56g2p	11	24	the	the	DET
sx61dj56g2p	11	25	substrate	substrate	NOUN
sx61dj56g2p	11	26	with	with	ADP
sx61dj56g2p	11	27	stacking	stack	VERB
sx61dj56g2p	11	28	faults	fault	NOUN
sx61dj56g2p	11	29	running	run	VERB
sx61dj56g2p	11	30	parallel	parallel	ADJ
sx61dj56g2p	11	31	to	to	ADP
sx61dj56g2p	11	32	the	the	DET
sx61dj56g2p	11	33	substrate	substrate	NOUN
sx61dj56g2p	11	34	surface	surface	NOUN
sx61dj56g2p	11	35	.	.	PUNCT
sx61dj56g2p	12	1	this	this	DET
sx61dj56g2p	12	2	crystalline	crystalline	NOUN
sx61dj56g2p	12	3	structure	structure	NOUN
sx61dj56g2p	12	4	favors	favor	VERB
sx61dj56g2p	12	5	highly	highly	ADV
sx61dj56g2p	12	6	crystalline	crystalline	ADJ
sx61dj56g2p	12	7	planar	planar	ADJ
sx61dj56g2p	12	8	growth	growth	NOUN
sx61dj56g2p	12	9	along	along	ADP
sx61dj56g2p	12	10	the	the	DET
sx61dj56g2p	12	11	substrate	substrate	NOUN
sx61dj56g2p	12	12	surface	surface	NOUN
sx61dj56g2p	12	13	which	which	PRON
sx61dj56g2p	12	14	can	can	AUX
sx61dj56g2p	12	15	also	also	ADV
sx61dj56g2p	12	16	be	be	AUX
sx61dj56g2p	12	17	directed	direct	VERB
sx61dj56g2p	12	18	along	along	ADP
sx61dj56g2p	12	19	additional	additional	ADJ
sx61dj56g2p	12	20	symmetry	symmetry	NOUN
sx61dj56g2p	12	21	-	-	PUNCT
sx61dj56g2p	12	22	breaking	break	VERB
sx61dj56g2p	12	23	pathways	pathway	NOUN
sx61dj56g2p	12	24	to	to	PART
sx61dj56g2p	12	25	produce	produce	VERB
sx61dj56g2p	12	26	asymmetric	asymmetric	ADJ
sx61dj56g2p	12	27	three	three	NUM
sx61dj56g2p	12	28	-	-	PUNCT
sx61dj56g2p	12	29	dimensional	dimensional	ADJ
sx61dj56g2p	12	30	structures	structure	NOUN
sx61dj56g2p	12	31	.	.	PUNCT
sx61dj56g2p	13	1	this	this	DET
sx61dj56g2p	13	2	work	work	NOUN
sx61dj56g2p	13	3	represents	represent	VERB
sx61dj56g2p	13	4	a	a	DET
sx61dj56g2p	13	5	first	first	ADJ
sx61dj56g2p	13	6	-	-	PUNCT
sx61dj56g2p	13	7	of	of	ADP
sx61dj56g2p	13	8	-	-	PUNCT
sx61dj56g2p	13	9	its	its	PRON
sx61dj56g2p	13	10	kind	kind	ADJ
sx61dj56g2p	13	11	demonstration	demonstration	NOUN
sx61dj56g2p	13	12	of	of	ADP
sx61dj56g2p	13	13	an	an	DET
sx61dj56g2p	13	14	on	on	ADP
sx61dj56g2p	13	15	-	-	PUNCT
sx61dj56g2p	13	16	substrate	substrate	NOUN
sx61dj56g2p	13	17	liquid	liquid	NOUN
sx61dj56g2p	13	18	-	-	PUNCT
sx61dj56g2p	13	19	phase	phase	NOUN
sx61dj56g2p	13	20	synthesis	synthesis	NOUN
sx61dj56g2p	13	21	of	of	ADP
sx61dj56g2p	13	22	oriented	orient	VERB
sx61dj56g2p	13	23	arrays	array	NOUN
sx61dj56g2p	13	24	of	of	ADP
sx61dj56g2p	13	25	highly	highly	ADV
sx61dj56g2p	13	26	crystalline	crystalline	ADJ
sx61dj56g2p	13	27	au	au	PROPN
sx61dj56g2p	13	28	nanoplates	nanoplates	PROPN
sx61dj56g2p	13	29	and	and	CCONJ
sx61dj56g2p	13	30	chiral	chiral	ADJ
sx61dj56g2p	13	31	nanostructures	nanostructure	NOUN
sx61dj56g2p	13	32	,	,	PUNCT
sx61dj56g2p	13	33	which	which	PRON
sx61dj56g2p	13	34	have	have	VERB
sx61dj56g2p	13	35	the	the	DET
sx61dj56g2p	13	36	potential	potential	NOUN
sx61dj56g2p	13	37	to	to	PART
sx61dj56g2p	13	38	forward	forward	VERB
sx61dj56g2p	13	39	viable	viable	ADJ
sx61dj56g2p	13	40	nanomanufacturing	nanomanufacture	VERB
sx61dj56g2p	13	41	technologies	technology	NOUN
sx61dj56g2p	13	42	for	for	ADP
sx61dj56g2p	13	43	the	the	DET
sx61dj56g2p	13	44	development	development	NOUN
sx61dj56g2p	13	45	of	of	ADP
sx61dj56g2p	13	46	functional	functional	ADJ
sx61dj56g2p	13	47	plasmonic	plasmonic	ADJ
sx61dj56g2p	13	48	devices	device	NOUN
sx61dj56g2p	13	49	.	.	PUNCT