id	sid	tid	token	lemma	pos
gt54kk93n27	1	1	in	in	ADP
gt54kk93n27	1	2	this	this	DET
gt54kk93n27	1	3	thesis	thesis	NOUN
gt54kk93n27	1	4	,	,	PUNCT
gt54kk93n27	1	5	i	i	PRON
gt54kk93n27	1	6	will	will	AUX
gt54kk93n27	1	7	give	give	VERB
gt54kk93n27	1	8	an	an	DET
gt54kk93n27	1	9	introduction	introduction	NOUN
gt54kk93n27	1	10	of	of	ADP
gt54kk93n27	1	11	the	the	DET
gt54kk93n27	1	12	development	development	NOUN
gt54kk93n27	1	13	of	of	ADP
gt54kk93n27	1	14	microneedle	microneedle	NOUN
gt54kk93n27	1	15	.	.	PUNCT
gt54kk93n27	2	1	several	several	ADJ
gt54kk93n27	2	2	fabrication	fabrication	NOUN
gt54kk93n27	2	3	methods	method	NOUN
gt54kk93n27	2	4	from	from	ADP
gt54kk93n27	2	5	other	other	ADJ
gt54kk93n27	2	6	groups	group	NOUN
gt54kk93n27	2	7	will	will	AUX
gt54kk93n27	2	8	be	be	AUX
gt54kk93n27	2	9	briefly	briefly	ADV
gt54kk93n27	2	10	presented	present	VERB
gt54kk93n27	2	11	,	,	PUNCT
gt54kk93n27	2	12	such	such	ADJ
gt54kk93n27	2	13	as	as	ADP
gt54kk93n27	2	14	anisotropic	anisotropic	NOUN
gt54kk93n27	2	15	wet	wet	ADJ
gt54kk93n27	2	16	etching	etching	NOUN
gt54kk93n27	2	17	method	method	NOUN
gt54kk93n27	2	18	,	,	PUNCT
gt54kk93n27	2	19	buried	bury	VERB
gt54kk93n27	2	20	microchannel	microchannel	NOUN
gt54kk93n27	2	21	method	method	NOUN
gt54kk93n27	2	22	,	,	PUNCT
gt54kk93n27	2	23	double	double	ADJ
gt54kk93n27	2	24	deep	deep	ADJ
gt54kk93n27	2	25	x	x	NOUN
gt54kk93n27	2	26	-	-	NOUN
gt54kk93n27	2	27	ray	ray	NOUN
gt54kk93n27	2	28	lithography	lithography	NOUN
gt54kk93n27	2	29	method	method	NOUN
gt54kk93n27	2	30	,	,	PUNCT
gt54kk93n27	2	31	and	and	CCONJ
gt54kk93n27	2	32	so	so	ADV
gt54kk93n27	2	33	on	on	ADV
gt54kk93n27	2	34	.	.	PUNCT
gt54kk93n27	3	1	some	some	DET
gt54kk93n27	3	2	basic	basic	ADJ
gt54kk93n27	3	3	concepts	concept	NOUN
gt54kk93n27	3	4	of	of	ADP
gt54kk93n27	3	5	microfluidics	microfluidic	NOUN
gt54kk93n27	3	6	is	be	AUX
gt54kk93n27	3	7	introduced	introduce	VERB
gt54kk93n27	3	8	as	as	ADP
gt54kk93n27	3	9	a	a	DET
gt54kk93n27	3	10	theory	theory	NOUN
gt54kk93n27	3	11	foundation.the	foundation.the	DET
gt54kk93n27	3	12	microneedle	microneedle	NOUN
gt54kk93n27	3	13	fabricated	fabricate	VERB
gt54kk93n27	3	14	in	in	ADP
gt54kk93n27	3	15	university	university	PROPN
gt54kk93n27	3	16	of	of	ADP
gt54kk93n27	3	17	notre	notre	PROPN
gt54kk93n27	3	18	dame	dame	NOUN
gt54kk93n27	3	19	is	be	AUX
gt54kk93n27	3	20	based	base	VERB
gt54kk93n27	3	21	on	on	ADP
gt54kk93n27	3	22	triple	triple	ADJ
gt54kk93n27	3	23	anisotropic	anisotropic	NOUN
gt54kk93n27	3	24	bosch	bosch	PROPN
gt54kk93n27	3	25	etching	etching	NOUN
gt54kk93n27	3	26	.	.	PUNCT
gt54kk93n27	4	1	to	to	PART
gt54kk93n27	4	2	satisfy	satisfy	VERB
gt54kk93n27	4	3	the	the	DET
gt54kk93n27	4	4	further	further	ADJ
gt54kk93n27	4	5	experiment	experiment	NOUN
gt54kk93n27	4	6	requirement	requirement	NOUN
gt54kk93n27	4	7	,	,	PUNCT
gt54kk93n27	4	8	there	there	PRON
gt54kk93n27	4	9	are	be	VERB
gt54kk93n27	4	10	four	four	NUM
gt54kk93n27	4	11	microchannels	microchannel	NOUN
gt54kk93n27	4	12	on	on	ADP
gt54kk93n27	4	13	one	one	NUM
gt54kk93n27	4	14	chip	chip	NOUN
gt54kk93n27	4	15	which	which	PRON
gt54kk93n27	4	16	have	have	VERB
gt54kk93n27	4	17	different	different	ADJ
gt54kk93n27	4	18	penetration	penetration	NOUN
gt54kk93n27	4	19	depth	depth	NOUN
gt54kk93n27	4	20	.	.	PUNCT
gt54kk93n27	5	1	the	the	DET
gt54kk93n27	5	2	microchannel	microchannel	NOUN
gt54kk93n27	5	3	has	have	VERB
gt54kk93n27	5	4	a	a	DET
gt54kk93n27	5	5	rectangular	rectangular	ADJ
gt54kk93n27	5	6	cross	cross	NOUN
gt54kk93n27	5	7	section	section	NOUN
gt54kk93n27	5	8	shape	shape	NOUN
gt54kk93n27	5	9	,	,	PUNCT
gt54kk93n27	5	10	2.8	2.8	NUM
gt54kk93n27	5	11	ìøå_m	ìøå_m	NUM
gt54kk93n27	5	12	in	in	ADP
gt54kk93n27	5	13	width	width	NOUN
gt54kk93n27	5	14	,	,	PUNCT
gt54kk93n27	5	15	about	about	ADV
gt54kk93n27	5	16	10	10	NUM
gt54kk93n27	5	17	cm	cm	NOUN
gt54kk93n27	5	18	in	in	ADP
gt54kk93n27	5	19	length	length	NOUN
gt54kk93n27	5	20	,	,	PUNCT
gt54kk93n27	5	21	and	and	CCONJ
gt54kk93n27	5	22	its	its	PRON
gt54kk93n27	5	23	depth	depth	NOUN
gt54kk93n27	5	24	can	can	AUX
gt54kk93n27	5	25	be	be	AUX
gt54kk93n27	5	26	determined	determine	VERB
gt54kk93n27	5	27	by	by	ADP
gt54kk93n27	5	28	the	the	DET
gt54kk93n27	5	29	etching	etch	VERB
gt54kk93n27	5	30	time.through	time.through	NOUN
gt54kk93n27	5	31	the	the	DET
gt54kk93n27	5	32	testing	testing	NOUN
gt54kk93n27	5	33	with	with	ADP
gt54kk93n27	5	34	water	water	NOUN
gt54kk93n27	5	35	and	and	CCONJ
gt54kk93n27	5	36	air	air	NOUN
gt54kk93n27	5	37	,	,	PUNCT
gt54kk93n27	5	38	the	the	DET
gt54kk93n27	5	39	design	design	NOUN
gt54kk93n27	5	40	and	and	CCONJ
gt54kk93n27	5	41	fabrication	fabrication	NOUN
gt54kk93n27	5	42	process	process	NOUN
gt54kk93n27	5	43	are	be	AUX
gt54kk93n27	5	44	proved	prove	VERB
gt54kk93n27	5	45	to	to	PART
gt54kk93n27	5	46	be	be	AUX
gt54kk93n27	5	47	feasible	feasible	ADJ
gt54kk93n27	5	48	.	.	PUNCT
gt54kk93n27	6	1	from	from	ADP
gt54kk93n27	6	2	the	the	DET
gt54kk93n27	6	3	comparison	comparison	NOUN
gt54kk93n27	6	4	of	of	ADP
gt54kk93n27	6	5	measured	measure	VERB
gt54kk93n27	6	6	air	air	NOUN
gt54kk93n27	6	7	flow	flow	NOUN
gt54kk93n27	6	8	rate	rate	NOUN
gt54kk93n27	6	9	and	and	CCONJ
gt54kk93n27	6	10	the	the	DET
gt54kk93n27	6	11	simulated	simulate	VERB
gt54kk93n27	6	12	data	datum	NOUN
gt54kk93n27	6	13	in	in	ADP
gt54kk93n27	6	14	comsol	comsol	NOUN
gt54kk93n27	6	15	,	,	PUNCT
gt54kk93n27	6	16	the	the	DET
gt54kk93n27	6	17	experimental	experimental	ADJ
gt54kk93n27	6	18	and	and	CCONJ
gt54kk93n27	6	19	simulated	simulated	ADJ
gt54kk93n27	6	20	results	result	NOUN
gt54kk93n27	6	21	match	match	VERB
gt54kk93n27	6	22	well	well	ADV
gt54kk93n27	6	23	within	within	ADP
gt54kk93n27	6	24	experimental	experimental	ADJ
gt54kk93n27	6	25	error	error	NOUN
gt54kk93n27	6	26	.	.	PUNCT
gt54kk93n27	7	1	the	the	DET
gt54kk93n27	7	2	simulated	simulated	ADJ
gt54kk93n27	7	3	water	water	NOUN
gt54kk93n27	7	4	flow	flow	NOUN
gt54kk93n27	7	5	rate	rate	NOUN
gt54kk93n27	7	6	is	be	AUX
gt54kk93n27	7	7	less	less	ADJ
gt54kk93n27	7	8	than	than	ADP
gt54kk93n27	7	9	30	30	NUM
gt54kk93n27	7	10	picoliters	picoliter	NOUN
gt54kk93n27	7	11	/	/	SYM
gt54kk93n27	7	12	s	s	NOUN
gt54kk93n27	7	13	at	at	ADP
gt54kk93n27	7	14	small	small	ADJ
gt54kk93n27	7	15	pressures	pressure	NOUN
gt54kk93n27	7	16	.	.	PUNCT