id	author	title	date	pages	extension	mime	words	sentence	flesch	summary	cache	txt
xp68kd19z6x	Louisa Catharina Schneider	Fabrication of Single Electron Transistors using Atomic Layer Deposition	2014		.txt	text/plain	128	5	47	Currently, the choice of SET material is limited to metals that can be thermally oxidized, which has its limitations in terms of thickness control for ultra-thin tunnel barrier oxides. Our goal is to establish a fabrication process that uses alumina as tunnel barriers sandwiched between two platinum electrodes.	cache/xp68kd19z6x.txt	txt/xp68kd19z6x.txt