id	author	title	date	pages	extension	mime	words	sentence	flesch	summary	cache	txt
s4655d8932r	Qingling Hang	Molecular Liftoff Technology by Electron Beam Lithography for Molecular Electronics Devices	2004		.txt	text/plain	322	16	39	For molecular nanopatterning, surface cleanliness is critical for molecular deposition and the investigation of deposited molecular patterns. Compared with PMMA resist, both of these two resists are not appropriate for molecular nanopatterning.	cache/s4655d8932r.txt	txt/s4655d8932r.txt