id	author	title	date	pages	extension	mime	words	sentence	flesch	summary	cache	txt
rj430289d38	Faisal Ahmed Shah	Exchange-Biased Magnetic Multilayers for Nanomagnet Logic Applications	2015		.txt	text/plain	368	17	56	In this regard, a double e-beam exposure technique with 3δ overlay accuracy of 4 nm was developed to fabricate NML datalines with sub-10-nm spacing. Types and causes of error in ultra-dense NML dataline were also investigated.	cache/rj430289d38.txt	txt/rj430289d38.txt