id	author	title	date	pages	extension	mime	words	sentence	flesch	summary	cache	txt
3484zg66p2g	Vishwanath Joshi	Implementation of Locos (Local Oxidation of Silicon) Isolation Scheme in IC Fabrication	2004		.txt	text/plain	204	13	59	This is done by covering the active regions of the substrate with a thin layer of silicon nitride. Silicon nitride acts as a diffusion barrier to the oxidizing species.	cache/3484zg66p2g.txt	txt/3484zg66p2g.txt